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Plasma etching is a form of plasma process … Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.ing the physical properties of the target.
, Plasmaätzen ist ein materialabtragendes, p … Plasmaätzen ist ein materialabtragendes, plasmaunterstütztes Trockenätz-Verfahren, das besonders in der Halbleiter-, Mikrosystem- und großtechnisch eingesetzt wird. Beim Plasmaätzen unterscheidet man zwischen einem Ätzabtrag aufgrund einer chemischen Reaktion (Chemical-dry-etching-Verfahren (CDE)) und einem physikalischen Abtrag der Oberfläche aufgrund von Ionenbeschuss.der Oberfläche aufgrund von Ionenbeschuss.
, La gravure au plasma est une technique de gravure sèche utilisée en microfabrication (microélectronique).
, Plasma-etsen, ook wel droog etsen genoemd, is het proces waarmee met behulp van een plasma een deel van de bovenste laag van een substraat of basismateriaal wordt verwijderd bij relatief lagere temperatuur.
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| rdfs:comment |
Plasmaätzen ist ein materialabtragendes, p … Plasmaätzen ist ein materialabtragendes, plasmaunterstütztes Trockenätz-Verfahren, das besonders in der Halbleiter-, Mikrosystem- und großtechnisch eingesetzt wird. Beim Plasmaätzen unterscheidet man zwischen einem Ätzabtrag aufgrund einer chemischen Reaktion (Chemical-dry-etching-Verfahren (CDE)) und einem physikalischen Abtrag der Oberfläche aufgrund von Ionenbeschuss.der Oberfläche aufgrund von Ionenbeschuss.
, Plasma etching is a form of plasma process … Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.ing the physical properties of the target.
, Plasma-etsen, ook wel droog etsen genoemd, is het proces waarmee met behulp van een plasma een deel van de bovenste laag van een substraat of basismateriaal wordt verwijderd bij relatief lagere temperatuur.
, La gravure au plasma est une technique de gravure sèche utilisée en microfabrication (microélectronique).
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| rdfs:label |
Plasmaätzen
, Gravure au plasma
, Plasma etching
, Gravat amb plasma
, Plasma-etsen
|
